Benjamin J. Hauptman, JD '80

Adjunct Professor, Patent Application Drafting and Infringement Avoidance Strategies (PADIAS) Program, Dean’s Advisory Council Member

Hauptman is a Senior Partner with Lowe, Hauptman, Ham & Berner, a specialty intellectual property law firm with offices in Alexandria (VA), Taiwan and Tokyo. He has extensive experience in counseling clients in all aspects of enforcement and infringement of intellectual property rights, and his practice includes patent prosecution in the complex mechanical and electrical arts, semiconductor and display technologies, automotive, laser machining and complex mechanical and instrumentation arts.

As an Adjunct Professor of Law, Hauptman developed and directs the Patent Application Drafting and Infringement Avoidance Strategies (PADIAS) program, a 52-hour course for intellectual property professionals conducted annually in Tokyo and elsewhere in Asia. Hauptman is also a Professor of Law at the National Law School of India University in Bangalore, India, and a member of the Advisory Council to the Franklin Pierce Center for Intellectual Property at UNH Law.

Hauptman holds a Bachelor’s Degree in Engineering from the Massachusetts Institute of Technology and a Juris Doctor Degree from the Franklin Pierce Law Center. He is admitted to practice in the District of Columbia and Virginia, and before the U.S. Court of Appeals for the District of Columbia Circuit, U.S. Court of Appeals for the Federal Circuit, U.S. District Court, Eastern District of Virginia, and the U.S. Patent and Trademark Office.